OAI Adds Nano Imprint Lithography With Sub 20 Nm Resolution

OAI (Optical Associates Inc.) announces today that it has added NANO IMPRINT LITHOGRAPHY to its mask aligners.  Working with Nanolithosolutions Inc. (NLS), OAI is offering a nano imprint module as an option for the OAI mask aligners.  The module can be included with new orders or retrofit onto existing systems.  The module comes complete with wafer and mask holder and a nano imprint controller to control the process steps.  OAI also supplies a complete starter kit of materials.

OAI’s nano imprint module was developed by HP after years of research and development.   “After extensive comparisons, OAI chose the HP process due to its one-step Auto ReleaseTM which simplifies the imprint process. OAI mask aligners are known for their flexibility and the imprint modular approach extends the value of OAI’s mask aligners.  Our customers recognize that OAI continues to add value and flexibility to our mask aligners,” said Dr. Charles Turk, President of OAI.  “OAI previously announced the Contact Liquid Photopolymer (CliPP) module for microfluidics.  This additional module for nanotechnology clearly sets the OAI mask aligners apart from all of its competition,” he added.

The nano imprint module is based upon the research at HP labs.  It is a simple, easy to use process that is adaptable to all OAI mask aligners.  The mask aligners can be used as  standard mask aligners or as an imprint systems when the module is added.  The module can be easily removed at any time to utilize the mask aligner as a standard aligner.