Rohm and Haas Announces Availability of Second-Generation VaporStation Central Delivery System

Rohm and Haas Electronic Materials today announced that a second-generation VaporStation(TM) central delivery system, which provides several enhancements to the highly-capable original version, is now available. The new systems use the latest version of the IvMB(TM) inverted mini bubbler, optimized control software and an improved panel layout.

The VaporStation(TM) Central Delivery System from Rohm and Haas Electronic Materials can deliver a stable metalorganic precursor vapor at a precisely controlled concentration to up to 10 metalorganic chemical vapor deposition (MOCVD) reactors from a single 20 kg supply cylinder. Pictured is the VaporStation delivery system with the cabinet closed. (Photo: Business Wire)

As the leading global supplier of metalorganic (MO) precursors, Rohm and Haas designed the VaporStation central delivery system in cooperation with Matheson Tri-Gas, Inc., a leader in molecule delivery systems for more than 15 years. The system is designed to deliver trimethylgallium (TMGa) and other MO precursors to multiple MO chemical vapor deposition (MOCVD) reactors from a central supply source cabinet using a high-purity carrier gas. MO precursors are used to produce LEDs, solar cells, laser diodes for CD and DVD, and other compound semiconductor devices.

Rohm and Haas Electronic Materials engineered the upgraded system to provide a near constant fill level in the IvMB evaporator, optimized metalorganic-carrier gas intermixing, and improved efficiency and ergonomics. "First-generation systems have been installed at industry-leading manufacturers since 2004 with an excellent record for reliability and performance," said Joe Reiser, general manager for Rohm and Haas Electronic Materials’ Metalorganics business. "Everything we learned from the use of these systems and the customer feedback we received was incorporated into the design of the second generation."

The flexibility, control and economy of the VaporStation central delivery system has appealed to Rohm and Haas Electronic Materials customers since its debut in 2004. The system can deliver a stable MO precursor concentration at a precisely controlled flow rate to up to 10 MOCVD reactors from a single 20 kg supply cylinder. The VaporStation delivery system has shown excellent performance and superior economy over the traditional on-board MO source approach in which each MOCVD reactor requires its own cylinder.

Rohm and Haas Electronic Materials anticipates that the installed base of its VaporStation central delivery system will continue to rise quickly and has recently installed several second-generation VaporStation central delivery systems at leading LED manufacturers and more installations are scheduled this year. As the high-brightness LED industry continues to add capacity, the industry is turning towards innovative technology to reduce their production costs and drive efficiency.

Rohm and Haas Electronic Materials is also closely monitoring customer demand and maintaining its quality assurance efforts aimed at zero-error delivery of precursors during the deposition process. "With a central delivery system supplying a significant portion of an LED fab, there is no tolerance for any error and we are ready for this challenge," said Reiser. "Rohm and Haas has more than 30 years of experience providing high purity metalorganic precursors to the compound semiconductor markets. Our close collaboration with our customers and MOCVD equipment manufacturers has shown us that there is a need for the VaporStation delivery system. We believe we are best positioned to supply both the precursors and a reliable delivery system".

IvMB™ is a trademark of Matheson Tri-Gas, Inc.

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