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  • Supplier Profile
    XEI Scientific, Inc. was founded in 1991 by Ronald Vane to provide an effective way to gently clean scanning electron microscopes (SEMs), focused ion beams (FIBs) and other vacuum systems. XEI...
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    Phenom. Making SEM personal Phenom, world’s fastest Desktop Scanning Electron Microscope takes your imaging performance to a higher level. The Phenom desktop scanning electron microscope...
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    ASML is a world leader in the manufacture of advanced technology systems for the semiconductor industry. The company offers an integrated portfolio for manufacturing complex integrated circuits (also...
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    DME - Danish Micro Engineering A/S is one of the oldest manufacturers of Scanning Probe Microscopes (see History of DME) and since 1989 active in nanotechnology. Our instruments are characterized by...
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    Raith is a leading precision technology solution provider for nanofabrication, electron beam lithography, focused ion beam fabrication, nanoengineering and reverse engineering applications. Customers...
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    The Microscopy business group at Carl Zeiss is the world's only manufacturer of light, X-ray, electron, and ion microscopes. The company's extensive portfolio enables industrial, research and...
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    International technology group SCHOTT produces high-quality components and advanced materials, including specialty glass, glass-ceramics, and polymers. Many SCHOTT products have high-tech applications...
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    Molecular Vista designs, develops, and provides tools that allow its customers to probe and understand matter at the molecular level through quantitative visualization. Its first product, VistaScope,...
  • Article - 26 May 2005
    Scanning Capacitance Microscopes (SCM) and Scanning Probe Microscopes (SPM) can be used to study Metal Oxide Semiconductor (MOS) structures. This article looks at the fabrication of short and long...
  • Supplier Profile
    Nanosurf: Zoom into the future Nanosurf is a company that thrives on challenges at the frontier of what is physically achievable. By concentrating our collective efforts on the obstacles that stand...

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