45 Nano Lith Breakthrough From Japanese - News Item

Dec 2 2003

A material that can be used for F2 lithography has been made by a Japanese manufacturer, Mitsui Mining and Smelting.

By using a fluorine laser with a lens made of calcium fluoride crystal without any of molecular oxygen they have been able to create 45 nanometer circuit lines on semiconductors.

Posted 18th August 2003

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