Molecular Imprints Sales Testament To Systems Capabilities - News Item

Molecular Imprints, Inc. (MII), the leading manufacturer of step and flash (S-FIL) imprint lithography equipment, continues to prove the capabilities of its systems with the latest sales of its Imprio 100 tool to South Korea's new National Nanofab Center at the Korea Institute of Science and Technology, as well as to a global electronics company headquartered in Northern California. The Imprio 100 system represents the next generation in nano-lithography. This tool delivers high resolution, sub-micron alignment, and 3-dimensional replication, to customers seeking cost-effective, sub-100nm lithography. The Imprio 100 can handle up to 200mm wafers, with fine alignment to 250nm, 3 sigma.

"We are very excited that these two leading customers are using our S-FIL technology in their latest research and development," said Dr. Norm Schumaker, CEO of Molecular Imprints. "These purchases provide strong customer validation of our advanced performance and signify a new, long-awaited era in lithography, which has the potential to revolutionize electronic products and applications. In addition to providing the best nano-imprint technology, MII's goal is to now offer process extendibility and support that can enable device features down to 30nm for a variety of applications such as CMOS processing, photonics, bio devices and many others."

Posted 10^th February 2004