Nanolithography News

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CEA-Leti Reports Latest Achievements on MAPPER’s Lithography Solution

CEA-Leti has reported noteworthy advancements of the massively parallel direct write technology designed by MAPPER Lithography.

From CEA-Leti 14 Feb 2012

Development of E-Beam Proximity Effect Correction Methods for Mask Writing and Maskless Lithography

Fraunhofer Center Nanoelectronic Technologies (CNT) has joined Dresden and ASELTA Nanographics to develop e-beam proximity effect correction methods for maskless lithography (ML2) and mask writing applications.

13 Feb 2012

Development of Novel Tip Aids in Nanolithography and Nanomanufacturing Applications

A team of researchers at IBM Research – Zurich, the University of Wisconsin-Madison and the University of Pennsylvania has developed a nano-sized silicon carbide tip that has a wear resistance of 10,000 folds higher than that of the earlier designs, a major breakthrough in nanomanufacturing for applications such as biosensors for environment and healthcare monitoring.

From IBM Zurich Research Laboratory 10 Feb 2012

WNLO to get Electron Beam Lithography Capabilities Thanks to Vistec

Vistec Lithography, B.V. is pleased to announce today that Wuhan National Laboratory for Optoelectronics (WNLO) at the Huazhong University of Science and Technology (HUST) in Wuhan, P.R. of China signed off its electron-beam lithography system Vistec EBPG5000pES.

16 Jan 2012

USHIO Expands UX4 Series of Full-Field Projection Lithography Tools

USHIO has expanded its modular full-field projection lithography tool line called the UX4 Series with the launch of three new models, the UX4-ECO FFPL 150, the UX4-MEMS FFPL 200 and the UX4-3Di FFPL 300, for producing power devices, MEMS devices and three-dimensional LSI devices, respectively.

7 Dec 2011

Gigaphoton Supplies 1,000th Excimer Laser for Semiconductor Photolithography

Gigaphoton, a provider of lithography light sources, has announced the delivery of its 1,000th excimer laser for photolithography applications in semiconductor fabrication.

7 Dec 2011

ASML, Tokyo Electron Sign Joint Development Deal for Lithography and EUV Technologies

ASML has signed a deal with Tokyo Electron to jointly promote ArF immersion and extreme ultraviolet (EUV) development activities utilizing advanced lithography cluster.

2 Dec 2011

Toppan Photomasks to Invest $20 million in its Joint Venture Facility in Shanghai

Toppan Printing’s subsidiary, Toppan Photomasks has declared plans to invest $20 million to expand the production capacity and technology capabilities of its Shanghai joint venture facility in order to meet the growing demand of the semiconductor industry in China.

From Toppan Photomasks Inc. 19 Nov 2011

Researchers Study Role of Temperature in Controlling in Dip-Pen Nanolithography

Scientists at the Lawrence Berkeley National Laboratory (Berkeley Lab) of the U.S. Department of Energy (DOE) have studied the function of temperature in manipulating a nanofabrication technique known as dip-pen nanolithography for writing chemical patterns down to 20 nm.

9 Nov 2011

EUVL and Lithography Extensions Symposia Highlights Industry’s Progress

The 2011 International Extreme Ultraviolet Lithography (EUVL) and Lithography Extensions (LE) Symposia, which was jointly organised by EIDC, IMEC and Sematech has brought out the technological advancements, challenges and infrastructure issues in the EUVL industry.

4 Nov 2011

Nanolithography News

CEA-Leti Reports Latest Achievements on MAPPER’s Lithography Solution

Development of E-Beam Proximity Effect Correction Methods for Mask Writing and Maskless Lithography

Development of Novel Tip Aids in Nanolithography and Nanomanufacturing Applications

WNLO to get Electron Beam Lithography Capabilities Thanks to Vistec

USHIO Expands UX4 Series of Full-Field Projection Lithography Tools

Gigaphoton Supplies 1,000th Excimer Laser for Semiconductor Photolithography

ASML, Tokyo Electron Sign Joint Development Deal for Lithography and EUV Technologies

Toppan Photomasks to Invest $20 million in its Joint Venture Facility in Shanghai

Researchers Study Role of Temperature in Controlling in Dip-Pen Nanolithography

EUVL and Lithography Extensions Symposia Highlights Industry’s Progress

Harnessing Biology for Sustainable Energy Production

Calcium Carbonate Nanoparticles: Boosting T Cell Activation in Cancer Therapy

Low-Temperature Synthesis of Ultrathin Two-Dimensional Materials via BiOCl-Assisted CVD

Novel Method for Producing Superior Carbon Nanofibers via Additive Nanostructuring

New Approach to Functionalizing Graphene for Electronic Applications

Conversations on AFM: Applications of BioAFM in Life Science

Conversations on AFM: The Technology and History Behind AFM and SPM

Recent Advances in High-Speed Atomic Force Microscopy to Improve Research Into Protein Dynamics

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