XTREME Technologies Achieves 30 W Output at Intermediate Focus in EUV Lithography

XTREME Technologies, which is a wholly owned subsidiary of USHIO has announced that it has achieved a stable output of 30 W at intermediate focus within a 100% duty cycle during bulk manufacture in EUV lithography.

The company announced this at the 2011 International Symposia on Extreme Ultraviolet Lithography and Lithography extensions, which was conducted at Miami.

XTREME Technologies had reached 15 W output at intermediate focus at 100% duty cycle during February 2011. The company gradually progressed to a steady output of 30 W by addressing all the issues such as thermal and debris processing that is usually faced during an output increase. It has also devised solutions for these issues. With the help of a light source, the company has also confirmed that it has reached an output of 100 W at intermediate focus.

USHIO has been in the process of developing EUV light sources for the purpose of discharge plasma methods that are done with the assistance of laser. An EUV light source having a very short wavelength of 13.5 nm is considered as the final light source for the semiconductor lithography process. It is essential for the fabrication of semiconductor devices on and after the 22nm generation. USHIO had bought XTREME Technologies in 2008 and the assets of Phillips Extreme UV in 2010 in order to increase research programmes and development of EUV light sources.