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Next-Generation EUV Photomask from Toppan Printing for Advanced Semiconductors

Toppan Printing Co., Ltd. (hereafter Toppan Printing; head office: Chiyoda Ward, Tokyo; President & Representative Director: Shingo Kaneko) has developed a next-generation EUV photomask for leading-edge semiconductors.

25 Feb 2016

Oxford Instruments Announce more Speakers for their 2D Materials Processing Technology Workshop

The 2D materials workshop, on Thursday April 7th 2016, is going to take place at the National Graphene Institute (NGI) of Manchester University.

From Oxford Instruments Plasma Technology 24 Feb 2016

New Way to Focus Light Beyond Normal Wavelengths to Reach Nanoscales in Length

Researchers at the Technion-Israel Institute of Technology have developed technology to compress light wavelengths fourfold, providing a way to focus light beyond normal wavelengths to reach nanoscales (a nanometer is a billionth of a meter) in length.

22 Feb 2016

Rudolph Technologies Receives Order for JetStep Lithography System from OSAT

Rudolph Technologies, Inc. announced today that a leading outsourced assembly and test facility (OSAT) has placed an order for the JetStep® Lithography System for the semiconductor advanced packaging industry’s first panel manufacturing line.

2 Feb 2016

New Report Analyzes Global Market for Nanopatterning

Research and Markets has announced the addition of the "Nanopatterning - Global Strategic Business Report" report to their offering.

From Research and Markets 16 Oct 2015

Leading Semiconductor Manufacturer Places Order for Ultratech’s Advanced Packaging AP300 Lithography Systems

Ultratech, Inc., a leading supplier of lithography, laser-processing and inspection systems used to manufacture semiconductor devices and high-brightness LEDs (HBLEDs), as well as atomic layer deposition (ALD) systems, today announced that it has received a large multiple-system order from a leading semiconductor manufacturer for its advanced packaging AP300 lithography systems.

15 Oct 2015

Perception Survey Reveals Increased Optimism in Implementation of EUV Lithography for Semiconductor HVM

The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced the completion of its fourth annual eBeam Initiative members' perceptions survey. A record 64 industry luminaries representing 35 different companies from across the semiconductor ecosystem—including chip design, equipment, materials and manufacturing as well as photomasks—participated in this year's survey.

1 Oct 2015

SUSS MicroTec Receives Order for Multiple SUSS MicroTec Photonic Systems Lithography Tools in Q3 2015

SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor industry and related markets, has received an order for multiple SUSS MicroTec Photonic Systems lithography tools in Q3 2015 from a leading semiconductor manufacturer. The strategically important order includes multiple DSC300 Gen2 projection scanners, which are produced at the company’s facility in Corona, USA. The order volume is in the high single-digit million Euro range.

From SUSS MicroTec AG 25 Sep 2015

Cornell NanoScale Science and Technology Facility to be Part of National Nanotechnology Coordinated Infrastructure

The National Science Foundation has selected the Cornell NanoScale Science and Technology Facility (CNF) to be part of the newly established National Nanotechnology Coordinated Infrastructure (NNCI). Cornell will receive $8 million from the federal agency over five years.

18 Sep 2015

Mycronic Receives Another Order for Prexision Platform-Based Mask Writer

Mycronic AB (publ), has received yet another order for a mask writer, built on the Prexision platform, replacing an older system for manufacturing of display photomasks. The system, sold to a customer in Asia, is scheduled to be delivered during the second half of 2016.

31 Aug 2015

Nanolithography News

Next-Generation EUV Photomask from Toppan Printing for Advanced Semiconductors

Oxford Instruments Announce more Speakers for their 2D Materials Processing Technology Workshop

New Way to Focus Light Beyond Normal Wavelengths to Reach Nanoscales in Length

Rudolph Technologies Receives Order for JetStep Lithography System from OSAT

New Report Analyzes Global Market for Nanopatterning

Leading Semiconductor Manufacturer Places Order for Ultratech’s Advanced Packaging AP300 Lithography Systems

Perception Survey Reveals Increased Optimism in Implementation of EUV Lithography for Semiconductor HVM

SUSS MicroTec Receives Order for Multiple SUSS MicroTec Photonic Systems Lithography Tools in Q3 2015

Cornell NanoScale Science and Technology Facility to be Part of National Nanotechnology Coordinated Infrastructure

Mycronic Receives Another Order for Prexision Platform-Based Mask Writer

Calcium Carbonate Nanoparticles: Boosting T Cell Activation in Cancer Therapy

Harnessing Biology for Sustainable Energy Production

Emergent Quantum Phenomena in Self-Organized Graphene Systems

Carbon Dioxide to 3D Printed Carbon Nanocomposites: A Sustainable Innovation

Feasibility Study with Evonik Confirms LEON’s FR-JET Technology’s Performance in Advanced Nanoparticle Manufacturing for Drug Delivery

Conversations on AFM: Applications of BioAFM in Life Science

Conversations on AFM: The Technology and History Behind AFM and SPM

Recent Advances in High-Speed Atomic Force Microscopy to Improve Research Into Protein Dynamics

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