Nanolithography News

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Toshiba and SK hynix Enter Agreement to Jointly Develop Nano Imprint Lithography

Toshiba today announced that it has entered into a definitive agreement with SK hynix on joint development of Nano Imprint Lithography (NIL). Engineers from the two companies will start development of basic technologies for the process at Toshiba’s Yokohama Complex in Yokohama, Japan in April this year, targeting practical use in 2017. Today’s announcement builds on an MOU that the companies signed in December last year.

6 Feb 2015

Leading OSAT Facility Acquires Rudolph JetStep® Advanced Packaging Lithography System

Rudolph Technologies, Inc. announced today that it has shipped the JetStep® Advanced Packaging Lithography System to a leading outsourced assembly and test (OSAT) facility. This new customer will use the JetStep W Series for fan-out wafer level packaging (FO-WLP) applications.

From Onto Innovation 3 Feb 2015

Bristol Awarded £450,000 to Develop GaN Nano-Engineered Semiconductors

The Universities of Bath, Bristol, Sheffield and Strathclyde and their industrial partners have been given funding to develop the UK into a future hub for the manufacture of advanced semiconductor materials.

23 Dec 2014

Atomic Force Microscopy Etches Nanoscale Patterns on Conductive Polymers

Researchers at Oak Ridge National Laboratory (ORNL) have successfully carved out nanoscale designs on polymer surfaces using atomic force microscopy (AFM).

From Oak Ridge National Laboratory 18 Dec 2014

Nanolithography Technique Uses Nanoscale Spheres to Create 3D Nanostructures

A new nanolithography technique that uses nanoscale polystyrene spheres to create 3D nanostructures for biomedical, photonic and electronic applications has been developed by researchers at the North Carolina State University (NC State).

10 Dec 2014

EV Group Dedicates NILPhotonics Competence Center for Nanoimprint Lithography Solutions

EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today announced that it has established the NILPhotonics™ Competence Center, which is designed to assist customers in leveraging EVG's suite of nanoimprint lithography (NIL) solutions to enable new and enhanced products and applications in the field of photonics.

2 Dec 2014

A*STAR’s Flexure-Based Electromagnetic Linear Actuator Wins Prestigious R&D Award

A Flexure-Based Electromagnetic Linear Actuator (FELA) developed by the Singapore Institute of Manufacturing Technology (SIMTech), a research institute of the Agency for Science, Technology and Research (A*STAR), is the only locally-developed innovation featured in the 2014 R&D 100 Awards, an international competition that recognises the 100 most technologically-significant products introduced into the marketplace over the past year.

26 Nov 2014

Mapper Lithography Selects SPTS’ Etch and PECVD Systems for New Fab in Moscow

SPTS Technologies, an Orbotech company and a supplier of advanced wafer processing solutions for the global semiconductor industry and related markets, today announced that Mapper Lithography has selected SPTS’ etch and low temperature chemical vapor deposition (CVD) systems on a Versalis fxP multi-technology platform for their new fab in Moscow.

25 Nov 2014

New Superfast 4G High-Volume, In-Line, 3D Topography Inspection System from Ultratech

Ultratech, Inc., a leading supplier of lithography, laser-processing and inspection systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), today introduced the Superfast 4G high-volume, in-line, 3D topography inspection system.

19 Nov 2014

SMIC Signs Volume Purchase Agreement with ASML for Lithography Systems

Semiconductor Manufacturing International Corporation the largest and most advanced pure-play foundry provider in China, and ASML Holding N.V., the world's leading provider of lithography systems, announce the signing of a volume purchase agreement (VPA) that will provide SMIC with lithography systems from ASML.

28 Oct 2014

Nanolithography News

Toshiba and SK hynix Enter Agreement to Jointly Develop Nano Imprint Lithography

Leading OSAT Facility Acquires Rudolph JetStep® Advanced Packaging Lithography System

Bristol Awarded £450,000 to Develop GaN Nano-Engineered Semiconductors

Atomic Force Microscopy Etches Nanoscale Patterns on Conductive Polymers

Nanolithography Technique Uses Nanoscale Spheres to Create 3D Nanostructures

EV Group Dedicates NILPhotonics Competence Center for Nanoimprint Lithography Solutions

A*STAR’s Flexure-Based Electromagnetic Linear Actuator Wins Prestigious R&D Award

Mapper Lithography Selects SPTS’ Etch and PECVD Systems for New Fab in Moscow

New Superfast 4G High-Volume, In-Line, 3D Topography Inspection System from Ultratech

SMIC Signs Volume Purchase Agreement with ASML for Lithography Systems

Calcium Carbonate Nanoparticles: Boosting T Cell Activation in Cancer Therapy

Harnessing Biology for Sustainable Energy Production

Emergent Quantum Phenomena in Self-Organized Graphene Systems

Carbon Dioxide to 3D Printed Carbon Nanocomposites: A Sustainable Innovation

Feasibility Study with Evonik Confirms LEON’s FR-JET Technology’s Performance in Advanced Nanoparticle Manufacturing for Drug Delivery

Conversations on AFM: Applications of BioAFM in Life Science

Conversations on AFM: The Technology and History Behind AFM and SPM

Recent Advances in High-Speed Atomic Force Microscopy to Improve Research Into Protein Dynamics

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