Nanofabrication News

RSS

Researchers Develop New Materials and Nanofabrication Techniques to Create Miniaturized Components

A research group of John Fourkas, a Chemistry Professor from the University of Maryland, has created innovative materials and nanofabrication techniques to produce miniaturized components essential for sensors, medical diagnostics and other applications.

16 Jul 2012

EIDEC Selects Luminescent’s DPS Software for EUV Mask Development Program

Luminescent Technologies, a computational metrology and inspection solution provider for the semiconductor manufacturing industry, has reported that its extreme ultraviolet (EUV) defect printability simulator (DPS) software has been adopted for EUVL Infrastructure Development Center (EIDEC)'s EUV mask development program.

13 Jul 2012

ASM International Launches Two New Advanced Deposition Systems

ASM International N.V, provider of production solutions for the semiconductor device industry, has introduced two new deposition systems to cater to the 300 mm high volume manufacturing (HVM) segment.

From ASM International 12 Jul 2012

Ghent University and Cambridge NanoTech Sign Licensing Agreement

Ghent University has been creating its particle and powder coating technologies for surface functionalization application.

10 Jul 2012

MEMC Launches Semiconductor Wafer to Facilitate High Throughput of Multigate Devices

MEMC Electronic Materials, the semiconductor and solar technology provider, has unveiled a new and advanced silicon wafer to enable the manufacture of junction-isolated FinFETs. Dubbed as MEMC FOX-Si, the new device is cost effective and addresses the challenges in manufacturing of FinFETs.

From GlobalWafers Co., Ltd. 9 Jul 2012

Pall to Unveil Latest Additions to its Purification and Filtration Portfolio

Pall is set to display its latest purification and filtration solutions for the semiconductor industry at the SEMICON West exposition to be held in San Francisco between July 10 and 12.

5 Jul 2012

Hurry - Make Sure You Book in for Etch Tech 2012

The Kavli Nanoscience Institute (KNI) at Caltech, USA and Oxford Instruments are extremely pleased with the bookings and interest in their joint Seminar and Workshop entitled Etch Tech 2012, taking place 16th-17th July. ...

From Oxford Instruments Plasma Technology 4 Jul 2012

UMC Secures License for IBM’s 20 nm Process Design Technology

United Microelectronics has licensed IBM’s technology for the development of UMC’s 20 nm CMOS process employing FinFET 3D transistors. The licensed technology is expected to hasten the delivery of the next generation 20 nm process to UMC’s customers.

From United Microelectronics Corporation 2 Jul 2012

Applied Materials Launches Etch System for 3D Memory Architecture

Applied Materials has introduced its latest dielectric etch system labeled the Applied Centura Avatar etch system that is designed to meet the challenges associated with the design of high density, terabit storage capacity, three-dimensional memory architecture.

From Applied Materials Inc. 29 Jun 2012

Cambridge NanoTech and Ghent University to Commercialize ALD Particle Coating Technology

Developer of atomic layer deposition (ALD) systems, Cambridge NanoTech, has entered into a licensing agreement with Ghent University for the commercialization of its ALD particle coating technology labeled the Cyrus system.

29 Jun 2012