Jul 15 2010
A new HemiPleat® Nano dust collector filter from Camfil Farr Air Pollution Control offers higher filtration efficiencies, longer service life, and lower pressure drop than competitive nano fiber filters, for energy savings and enhanced performance.
The manufacturer uses a new technology to apply a thick layer of highly durable nano fibers to the surface of the patented HemiPleat filter, yielding a MERV 14 efficiency rating – higher than that of most competitive filters.
The HemiPleat Nano media is strong enough to handle difficult dust challenges such as laser and plasma cutting, welding and thermal spray; and it will withstand rigorous pulse-cleaning for all types of dry dust applications, bringing longer service life and lower operational costs. The product line includes MERV 14 and MERV 16 efficiency options, with a choice of high performance standard or fire retardant cellulose-blend base media.
The new filter is also the only one to combine nano media with HemiPleat's patented open-pleat design. Open-pleat spacing allows better utilization of the media pack, resulting in better airflow through the cartridge for more efficient performance. Dust also releases more readily during pulse cleaning using less compressed air for many applications, bringing further energy savings. All HemiPleat filters carry a written performance guarantee to run at a lower pressure drop, meet or exceed current collection efficiencies, and last longer.
Source: http://www.farrapc.com/