Global Conference Will Provide Platform for Nanoelectronics Developers to Share Knowledge

A research team at the Grenoble-based CEA-Leti has been invited to deliver two papers at the International Conference on Frontiers of Characterization and Metrology for Nanoelectronics 2011 (IC-FCMN 2011), to be held in Grenoble between May 23 and 26.

This is the first time the annual event is being held outside the US. Key international players will use the event as a platform to study developments and trends in characterization and metrology that could drive the nanoelectronics industry in the coming years.

A Leti paper titled, ‘State-of-the-art Semiconductor Characterization in an Aberration-corrected Transmission Electron Microscope,’ will describe the manner, in which a TEM has helped develop and characterize new versions of the nano-scale systems. The paper ‘Hybrid Metrology and 3D-AFM Enhancement for CD Metrology Dedicated to 28nm Node-and-below Requirements’ describes a CD metrology solution called hybrid CD metrology that fine tunes morphological data obtained through multiple metrology methods.

The event will be held in the MINATEC Innovation Campus, and will offer a platform for characterization and metrology specialists, consumers and research laboratories to share knowledge and interact with each other. It could also lead to more research and collaborations.