Metryx, a provider of innovative nanotechnology related mass metrology devices, declared its involvement in the joint European Semiconductor Equipment Assessment Leveraging Innovation (SEAL) project.
During the project, Metryx in partnership with Intel and IMEC will evaluate the application of high-resolution mass metrology for the 20-nm node and lower.
Metryx Mass Metrology tool
The applications selected for evaluation are those that would pose as major metrology challenges for future-generation systems. For instance, the damage of substrate or loss of silicon due to high dose implant resist stripping results in variations in the characteristics of the device, which affects device performance and wafer output. A technique that can measure loss of silicon at the initial stage of device manufacturing would result in high return on investment caused by enhancement in quality of the products and fab output.
The President and Chief Executive Officer at Metryx, Dr. Adrian Kiermasz commented that as the company focuses on the next-generation of semiconductor production, financing from the SEAL project and the collaboration of research institutes and major IC producers will give Metryx a vital competitive edge. Mass metrology is of great importance to existing devices and the company expects its usage in the production chain to increase significantly as instruments reduce in size, he added.
SEAL is established by 38 project partners, including major research institutes, innovative start-ups, prominent IC producers, materials producers and semiconductor device producers in Europe. It speeds up the market maturity of new devices and develops devices at lower cost using the expertise of IC and materials producers, and equipment users.