Posted in | News | Nanolithography | Nanooptics and Nanophotonics

Heidelberg Announce Development of Advanced MOEMS with Chinese Counterpart

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Dec 14 2008

Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to the Zhejiang Normal University, located in Jinhau, China. System will be used in fabrication of Micro Optical Electro Mechanical Devices, as well as photomask production.

Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to the Zhejiang Normal University, located in Jinhau, China. System will be used in fabrication of Micro Optical Electro Mechanical Devices, as well as photomask production.

The DWL 66FS maskless lithography system will be capable of binary and grey scale exposure, layer to layer alignment, and will be able to produce minimum features down to 0.6 microns.

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