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Results 61 - 70 of 549 for Atomic layer deposition
  • Applied Materials Advances Sub-90nm Contacts with New ALD Tungsten Technology - New Technology
    Article - 5 Dec 2003
    Applied Materials, Inc. has introduced its new iSprint(TM) Centura(R) system, the industry's only integrated 300mm ALD/CVD (Atomic Layer Deposition / Chemical Vapor Deposition) system for sub-90nm...
  • ALD 200L Series from Kurt J. Lesker Company
    Equipment
    Kurt J. Lesker Company offer stand-alone ALD systems for basic research or completely integrated deposition systems for complex R&D applications. All of our ALD system platforms feature high speed ALD...
  • Universal Matter
    Supplier Profile
    Universal Matter has developed cleaner, faster, and less expensive technology to commercialize graphene, a carbon-based nanomaterial with multiple applications. Our proprietary Flash Joule Heating...
  • Graphenea
    Supplier Profile
    Graphenea is a leading graphene producer for industrial and research needs. Graphenea has developed a leading synthesis and transfer process to obtain high uniformity monolayer graphene films on any...
  • The Graphene Council
    Supplier Profile
    The Graphene Council  was founded in 2013 with a mission to serve the global community of graphene professionals. Today, The Graphene Council is the largest community in the world for graphene...
  • CamIn
    Supplier Profile
    CamIn acts as a flexible full-service strategic innovation partner helping it's clients from identifying new lucrative diversification and white space opportunities to successfully launching new...
  • Protochips
    Supplier Profile
    Protochips is the leader for in situ (real-world) electron microscopy products. The revolutionary systems include Atmosphere for pressurized gas and heating, Poseidon Select for liquid; electrical and...
  • Applications of Metal Halide Precursors in CVD/ALD Processes
    Article - 10 May 2013
    Metal halides were the first kind of precursor used in CVD processes.
  • Applications of Metal Diketonate Precursors for CVD and ALD
    Article - 10 May 2013
    Extensive research is ongoing to explore the role of acetylacetonate complexes and their derivatives as precursors for depositing oxide films using CVD/ALD.
  • Applications of Metal Cyclopentadienyl CVD/ALD Precursors
    Article - 10 May 2013
    Cyclopentadienyl (Cp) complexes have become attractive precursors for CVD/ALD as they are normally volatile and reactive towards water at considerable .

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