Dr. Cameron Chai

Semiconductor Firms and SEMATECH to Develop Metrology Tools for Extreme Ultraviolet Lithography Masks

SEMATECH declared that GLOBALFOUNDRIES, Intel, TSMC, and Samsung Electronics have joined the company’s EMI partnership to build vital metrology devices for detecting defects in advanced masks suitable for extreme ultraviolet lithography (EUVL). These semiconductor firms hope to manufacture defect-free EUVL in bulk volumes.

Cerulean Conducts Second Phase Clinical Study of Nanopharmaceutical for Lung Cancer Patients

Cerulean Pharma, a company that specializes in development and design of nanopharmaceuticals, declared that it has administered a dose of CRLX101 to the first group of patients as part of a random, non-small cell lung cancer (NSCLC) Phase 2 clinical study.

CVD Equipment Receives More Orders for Nanotechnology Devices

CVD Equipment, a company that designs and manufactures graphene, semiconductors, carbon nanotubes, MEMS, nanowires, and industrial coatings, received orders of nearly $24.6M for the first six months of 2011.

Berkeley Design Automation Signs Contract with EDA Distributors for Nanometer Circuit Verification

Berkeley Design Automation has signed new contracts with EDA distributors in order to improve demand for the Analog FastSPICE Platform.

Gigaphoton Affirms Debris Mitigating Technology of LPP Light Sources for EUV Lithography

Gigaphoton declared that the company is planning to ship its innovative technology for debris mitigation using magnetic fields in 2012 for laser-produced plasma (LPP) type light sources.

Chemists to Study Interactions between Carbon Nanotubes and Photoluminescent Materials

Rice University chemists have developed a platform to study the interactions between various photoluminescent materials and carbon nanotubes.

Snowbush Enhances Multi-Standard PHY IP Platform to Solve Design Issues at 28nm

Gennum Snowbush IP group has introduced the next-generation multi-standard (MS) PHY IP Platform on TSMC 28nm to help semiconductor manufacturers to significantly lower design and production costs and to improve product time-to-market.

Overview of Global Thin Film Solar Photovoltaic Production

Report Linker has added a new report, Thin Film Solar PV Manufacturing Equipment Worldwide, to its offerings.

Synopsys Joins Hands with GLOBALFOUNDRIES for 65nm Process Technologies

Mattson Technology Releases paradigmE Si for Silicon Etch Applications

Mattson Technology has released the paradigmE Si into the market, which is useful for semi-crucial silicon etch applications.