Nanofabrication News

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SPTS Launches Dry Etch Tool for Via Reveal Applications

SPTS, the company that designs, manufactures and supplies etching solutions for the semiconductor industry, has launched the Pegasus Rapier module, which is a dry etch process tool for via reveal processes.

6 Sep 2012

Entegris Launches 10 nm Liquid Filter for Semiconductor Manufacturing

Entegris has launched a new 10 nm liquid filter labeled the Intercept HPM Liquid Filter which is the latest innovation in its line of sophisticated filter solutions and find applications in exacting semiconductor manufacturing processes.

From Entegris 4 Sep 2012

Multimillion-Dollar 20nm Technology Contract to DCG Systems

DCG Systems, a company that provides solutions for characterization, diagnosis and defect localization of semiconductor circuits, has been awarded a multimillion dollar contract to supply its new generation OptiFIB Viper system that facilitates 20 nm circuit technologies to a renowned manufacturer of integrated devices (IDM).

1 Sep 2012

New Nanolithography Technique for Potential Biomedical Applications

A new, less expensive nanolithography technique has been developed by researchers at the North Carolina State University (NCSU).

From North Carolina State University 1 Sep 2012

InvenSense Organizes Online Demonstration of NF Platform for Design and Manufacture of MEMS

InvenSense, a company that develops motion tracking solutions for the consumer electronics market, has organized a demonstration of its patented Nasiri Fabrication (NF) platform to help MEMS developers to design and develop prototypes of their MEMS devices.

31 Aug 2012

Laser Shock-Induced Shaping Technology Tunes Nanowires

Researchers at the Purdue University have developed a novel "nano machine shop" that can be used for shaping ultrathin films and nanowires.

30 Aug 2012

Mattson Technology Announces Shipment of paradigmE Etch System to Key Chipmaker

Mattson Technology, a provider of cutting-edge semiconductor processing equipment, has reported the shipment of its paradigmE etch system to a key chipmaker.

16 Aug 2012

New Technique for Creating Sharp Color Images at Nanoscale

Scientists at A*STAR’s Institute of Materials Research and Engineering (IMRE) have devised a ground-breaking technique that utilizes metal-laced nano-scale structures to create sharp, full-spectrum color images at 100,000 dpi, without using dyes or inks.

14 Aug 2012

Annual Seminar to Address Latest Developments in Plasma Etch Deposition and Growth

The Molecular Foundry, LBNL, USA & Oxford Instruments Plasma Technology announce their 3rd annual seminar which will once again address the latest research and technologies in plasma etch deposition and growth.

From Oxford Instruments Plasma Technology 9 Aug 2012

Chemists Employ ITO Nanocrystals to Develop Advanced Conductive, Clear Thin Films

A study carried out by researchers from Brown University and ATMI has yielded an economical and easy method to develop an ITO film that scores high on conductivity and transparency.

9 Aug 2012