Nov 10 2010
Pall Corporation (NYSE:PLL), a global leader in filtration, separation and purification, will present a solution for meeting the aggressive new particle control standards in semiconductor manufacturing at the ULTRAPURE WATER Micro 2010 conference.
Dr. Barry Gotlinsky, vice president of Pall Industrial Scientific and Laboratory Services, will present a technical paper entitled Particle Control in UPW Through the use of Filtration Validated for Removal Performance at the Executive Forum on the opening day of the conference, to be held November 16-17 in Mesa, Arizona.
The ability to measure sub-50 nanometer (nm) particles in ultrapure (UPW) water used in semiconductor fabs does not exist, yet the International Technology Roadmap for Semiconductors (ITRS) has defined standards well below that level. The ITRS consortium of scientists, chip manufacturers and equipment suppliers fosters cost-effective advances in the performance of integrated circuits. In his presentation, Dr. Gotlinsky will outline methods to rate and validate filters and filtration modules which will ensure the reliable removal of particles from UPW at and below the 20 nanometer level. The filtered water enables the production of the fine line patterns used in the manufacture of the latest electronic devices.
“Filtration can control particles in UPW at levels significantly below current measurement capabilities,” said Dr. Gotlinsky. “Pall’s robust rating and validation process certifies that filter performance meets the 2009 ITRS requirements for particle control in UPW for semiconductor processes.”
Source: http://www.pall.com/