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Atomic Force Microscopy System Showcased at LOT Oriel

Leatherhead, UK-based LOT Orel showcased  the Park XE-100 AFM from Park Systems at its premises in Leatherhead between May 11 and 13.

LOT's Park XE-100 AFM

The event  presented both end users and distributors an opportunity to view the product and meet the design team from Park Systems.

The latest model features the company’s AFM (atomic force microscopy) nanotechnology. It offers a minimised drift rate, while the Step-and-Scan Automation feature delivers both the AFM and SPM (statistical parametric mapping) performance in Non-Contact nanoscale metrology. The system is ideally suitable for applications such as materials science, polymers and electrochemistry. It is also suitable for use in other applications in the nanoscience and engineering sectors. Its open side access feature allows for its use in a wide range of optical couplings.

Source: http://www.lot-oriel.com/

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