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AFOSR Grants Fund to Dr. Yang for Enhancing Nanoscale Engineering

Stevens Institute of Technology, Mechanical Engineering Associate Professor, Dr. Eui-Hyeok Yang has received Defense University Research Instrumentation Program (DURIP) grant for the year 2011.

Dr. Eui-Hyeok Yang who received DURIP Grant

DURIP provides funds for research instrumentation needed to enhance the quality of defense-related research carried out by universities and also enables the education of scientists and engineers in disciplines related to national defense.

This award granted by Air Force Office of Scientific Research (AFOSR) allows procuring devices for supporting continuing research work in nanoscale engineering and nanotechnology. The proposal made by Dr. Yang was approved by AFOSR for purchasing a high-resolution scanning probe microscope (SPM). The purchased microscope would allow imaging in ambient conditions for directly supporting the requirements of present research programs which are federally sponsored.

The research programs aim to develop a wide variety of technologies that include nanosensing, optoelectronics, nanoelectronics devices utilizing electronic materials of smaller dimension such as smart polymers, graphene, and nanotubes. The facility to allow imaging of nanoscale materials at very high-resolution is essential to Yang's research. In addition, the DURIP grant will contribute considerably to the development of entire multi-user facility, the micro device laboratory (MDL), headed by Dr. Yang.

MDL supports projects based on nanotechnology that utilize the SPM purchased from the grant. Additionally, the system will act as a key knowledge tool by nurturing multidisciplinary research, which involves interdisciplinary collaborations and intense education environment, among a growing number of degree students, senior researchers, and faculties at Stevens.

Apart from this, Dr. Yang has received few more contracts and grants from US Army ARDEC, NASA, AFOSR, and the National Science Foundation (NSF) for a nanoimprint lithography solution.

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