NEXX Systems, a processing equipment provider for sophisticated wafer-level packaging applications, has declared that International Rectifier, a provider of power management solutions, has bought several Apollo physical vapor deposition (PVD) systems for its fab facility located in Newport, Wales.
The Apollo PVD system will assist International Rectifier to launch its future-generation power devices such as insulated gate bipolar transistors (IGBTs). International Rectifier tested one Apollo PVD system in November 2011 and ordered for another system.
The Director of European Sales at NEXX Systems, Didier Andre stated that International Rectifier purchased the systems for a versatile competitive edge. The Apollo system not only processes ultra-thin wafers of the order of 50-200 ìm, but also allows wafer size changes during manufacturing within one hour. With the Apollo system, International Rectifier can now produce thin IGBT wafer, a promising technology recognized for its capability of handling higher currents, he said.
Andre further said that Apollo’s Bernoulli wafer handling system is ideal for thin wafers due to its ability to transfer them at atmospheric conditions on a processing tray. Unlike other sputtering systems, the Apollo system can handle many unique wafer shapes, bowed wafers and thin wafers with high annealing and temperature capabilities, he added.
International Rectifier’s Vice President of Technology Development, Alain Charles stated that the company is happy to partner with NEXX Systems to develop sophisticated packaging technologies that are new to the marketplace. Through its years of research work, the company will offer a product platform based on DirectFET products to its customers, Charles said.