Posted in | News | Nanofabrication

Veeco’s TurboDisc EPIK700 GaN MOCVD System Wins CS Industry Innovation Award

Veeco Instruments Inc. announced today that its TurboDisc® EPIK700™ Gallium Nitride (GaN) Metal Organic Chemical Vapor Deposition (MOCVD) System won the Compound Semiconductor (CS) Industry Innovation Award for the highest distinction in compound semiconductor manufacturing over the last 12 months.

Veeco's TurboDisc EPIK700 MOCVD System was recently awarded the 2015 Compound Semiconductor Industry Innovation Award. (Photo: Business Wire)

The CS Industry Innovation Award, which is based on an industry-wide nominating and voting process, recognizes success and development along the entire value chain of the compound semiconductor industry from research to completed device, focusing on the people, processes and products that drive the industry forward.

“We are honored to receive the CS Manufacturing Award for Innovation for the EPIK700 MOCVD system, particularly since the award was determined by a vote of our peers, LED customers and industry,” said Jim Jenson, Senior Vice President, Veeco MOCVD. “The EPIK700 MOCVD system has the highest performance in the industry, reducing per wafer cost by up to 20 percent, and will play a significant role in the growing adoption of solid state lighting.”

The Innovation Award was awarded for the most innovative outcome from compound semiconductor manufacturing and highlights products and processes that demonstrate the most innovative approaches for pushing the technical barriers during the last year. In mid-March, the 2015 award was presented to Veeco’s Sudhakar Raman, Vice President of Marketing, MOCVD at the CS International Conference in Frankfurt, Germany.

"Making LEDs with good margins is tough in the current environment,” said Richard Stevenson, editor of Compound Semiconductor Magazine. “Increasing yield and productivity holds the key, making the latest multi-wafer tool from Veeco an attractive option."

This is the third time in four years that Veeco has won a major CS Industry Award. The TurboDisc® MaxBright® Multi-Reactor Metal Organic Chemical Vapor Deposition (MOCVD) System was awarded the Compound Semiconductor Manufacturing Award in 2012 for the best innovative technology in compound semiconductor equipment. The GENxplor™ R&D Molecular Beam Epitaxy (MBE) System won the Compound Semiconductor (CS) Industry Award for the biggest breakthrough in compound semiconductor manufacturing in 2014.

Tell Us What You Think

Do you have a review, update or anything you would like to add to this news story?

Leave your feedback
Your comment type
Submit

While we only use edited and approved content for Azthena answers, it may on occasions provide incorrect responses. Please confirm any data provided with the related suppliers or authors. We do not provide medical advice, if you search for medical information you must always consult a medical professional before acting on any information provided.

Your questions, but not your email details will be shared with OpenAI and retained for 30 days in accordance with their privacy principles.

Please do not ask questions that use sensitive or confidential information.

Read the full Terms & Conditions.