Apr 2 2015
In accordance with Governor Andrew M. Cuomo’s successful technology-driven economic development model for New York State, SUNY Polytechnic Institute’s Colleges of Nanoscale Science and Engineering (SUNY Poly CNSE) today announced Hitachi Chemical Co., Ltd. will establish its North American CMP development headquarters and first CMP research and development venture outside of Japan at SUNY Poly CNSE’s Nanotech complex in Albany.
The agreement is expected to generate $1.5 million in investments, including tools and infrastructure development, and will create or support up to 30 jobs, as Hitachi Chemical partners with SUNY Poly CNSE to research and develop next-generation chemical mechanical planarization (CMP) slurries for its global clientele.
“As a testament to Governor Andrew M. Cuomo’s vision for high-tech business growth and job creation in New York State, we are thrilled that Hitachi Chemical is the latest globally recognized company to decide to leverage SUNY Poly CNSE’s leading-edge facilities to further expand their business,” said Dr. Alain Kaloyeros, President and CEO of SUNY Poly. “We are proud to welcome Hitachi Chemical as they provide yet another example of how Governor Cuomo’s successful, innovation-based blueprint for New York State is generating economic opportunity.”
“We look forward to our collaboration with SUNY Poly CNSE, whose resources and know-how will undoubtedly enable Hitachi Chemical Group to develop novel slurries and provide the most advanced chemical mechanical planarization solutions for the global semiconductor industry,” said Hitachi Chemical Co. America, Ltd. President and CEO Toshinari Itakura. “As Hitachi Chemical accelerates its global expansion efforts to capture demand from emerging countries and other target markets, we look forward to utilizing this exciting partnership as a springboard to allow us to continue to offer the most advanced slurry products to support next-generation computer chip manufacturing.”
By locating its North American CMP development headquarters at SUNY Poly CNSE’s NanoTech Complex, Hitachi Chemical will be able to leverage SUNY Poly CNSE’s expertise, state-of-the-art resources, top-tier tools, and capabilities to further develop its processes and products, including researching alternative nanoparticles. In particular, Hitachi Chemical will gain access to SUNY Poly CNSE’s advanced polishing tool sets and metrology, used as part of the CMP process, which provides an unmatched opportunity to test slurries in an actual laboratory environment to obtain valuable insights into their efficacy.
A world leader in semiconductor chemicals and materials manufacturing, Hitachi Chemical currently supplies SUNY Poly CNSE with its advanced slurries for a number of ongoing cutting-edge computer chip research projects. SUNY Poly CNSE has recently selected Hitachi Chemical as their Process Of Record (POR) for two barrier slurries on multiple platforms; one as a replacement for current Back End Of Line (BEOL) liner applications as a result of significant defect improvements, and another for advanced BEOL liners. A slurry is a liquid solution with nanoparticles and key component of the computer chip manufacturing process, known as chemical mechanical planarization (CMP). Slurries are used to chemically react with materials that must be removed from a wafer, upon which computer chips are constructed in a step-by-step manner. Hitachi Chemical utilizes specific nano particles in its slurries, which provide enhanced results.
Hitachi Chemical Co., ltd. is an advanced chemicals and materials manufacturer engaged in a wide range of areas, including semiconductor and display-related materials, printed wiring boards, copper clad laminates, photosensitive dry films, functional polymeric materials, adhesive films, carbon products, ceramics, and automotive-related products. As a result of work on many of these wide-ranging high-tech products and materials, access to wafers, which SUNY Poly CNSE is providing through this partnership, gives Hitachi Chemical a steady source of critical testing materials within some of the world’s most advanced facilities to further enhance both Hitachi Chemical and SUNY Poly CNSE’s chemical slurries and technological know-how.
As Hitachi Chemical ramps up operations at their North American CMP lab, located inside SUNY Poly CNSE’s Center for Environmental Sciences and Technology Management (CESTM) building, the initiative will start by supporting up to two jobs by the end of 2015, in addition to supporting one SUNY Poly CNSE graduate student’s research. From there, the partnership will lead to the creation or support of as many as 30 jobs and up to $5 million in investments over the next several years, with the potential for significant additional growth.
As a result of their decision to locate operations at their new SUNY Poly CNSE-based state-of-the-art residence, Hitachi Chemical will be able to more efficiently connect with their North American customers and will work with regional tech companies and applications support, enhancing the region’s growing supply chain as they continue to develop their products and supply New York State’s growing list of high-tech companies.
“Hitachi Chemical’s move to the SUNY Poly CNSE campus not only provides a powerful CMP partner, it will also support student research to spur the next generation of high-tech experts, further fueling Governor Andrew Cuomo’s high-tech corridor,” said SUNY Poly CNSE Associate Vice President for Business and Wafer Processing Frank Tolic. “Hitachi Chemical provides superior slurries that have benefitted CNSE’s advanced computer chip research, and this move will ensure that New York State remains at the forefront of semiconductor development, supporting Governor Cuomo’s advanced economy revolution.”