Jul 13 2007
From the world of nanotechnology to the solar power industry, Pall Corporation is recognized as a global leader in innovative filtration and purification technologies. The Company is unveiling its latest developments to help improve efficiency and economics of semiconductor and display manufacturing at SEMICON West in San Francisco.
“The increasing complexity of semiconductor devices gives rise to the need for more sophisticated contamination control solutions,” says Steve Chisolm, President of Pall Microelectronics. “This is a good thing for Pall. The technologies we are showcasing for chemical, gas, photolithography, ultrapure water and chemical mechanical polishing (CMP) applications are the latest demonstration of our leadership, technical prowess and innovation to help our customers meet more exacting requirements and succeed in their respective business.”
Chemical Filter Cartridges
Pall is featuring two filter cartridges designed specifically for wet chemical filtration in critical surface preparation processes. Both these filter cartridges provide a new platform for advanced performance. They allow customers to upgrade to the next level of finer retention without sacrificing flow rate while improving cost of ownership. The Ultipleat® SP DR Filter offers high flow with 30 nanometer (nm) retention for hydrofluoric acid (HF) and ambient clean and etch chemistries. For hot SPM and aggressive chemicals, the UltiKleenTM Excellar ER Filter provides 20 nm rated filtration. New disposable capsule options for each product will be displayed at the show.
Since the launch of these products, two of the world’s largest semiconductor manufacturing companies have adopted them for use in critical applications, including HF baths. Their experiences further validate the advantages that the filters provide to help customers achieve an advanced level of performance.
Gas Purification/Filtration Technologies
To meet the growing need for gas filters and purifiers that provide higher flow capacities, lower differential pressures and greater purity levels, Pall adds several new products to its line of Gaskleen® products for a diverse range of customer requirements.
The Company is introducing the High-Flow Gaskleen Top Mount Filter Assembly, its first all-metal, top-mount assembly that provides 3 nm and greater particle removal, at flow rates up to 100 standard liters per minutes (slpm). Constructed with a state-of-the-art stainless steel medium, the new filter assembly provides benefits for the most advanced processes including those that operate at higher temperatures, involve highly corrosive gases or are sensitive to moisture. Both W-seal and C-seal interfaces are available in either 1.125" or 1.5" base configurations.
For applications where fluoropolymer filters are preferred, Pall is introducing the Gaskleen V Filter Assembly, its latest generation fluoropolymer filter assembly which provides 3 nm and greater particle filtration at a higher flow capacity up to 1,200 slpm. This latest version filter assembly has a smaller footprint than previous products and ranks as the cleanest PTFE filter assembly available today.
The Company is also announcing the availability of its PG Series Gaskleen Purifier Assemblies and Manifolds, which can both purify and filter a large number of process gases with flow rates up to 1,000 slpm. Molecular contaminants such as moisture, oxygen, carbon dioxide, carbon monoxide and metal carbonyls can be removed to less than 1 part per billion (ppb). Integral filters remove particulate down to 3 nm. The PG series are available as stand-alone assemblies or with bypass manifolds containing isolation valves and a backplate for easy mounting.
Photolithography Filtration and Purification
Pall is showcasing its latest advances in lithography filtration and purification including its proven defect-reducing capabilities in 193 nm photoresist and BARC chemistries and its newest membrane developments. The latest generation 10 and 20 nm and 0.04 µm filtration products will be on display.
The all-polyethylene construction 10 nm PE-Kleen Filter, one of the tightest photolithography filters ever offered, is ideal for most lithography applications. Customers have already adopted Pall’s PE-Kleen filter for many critical lithography applications as it allows them to reach an even finer level of filtration without any sacrifice in pressure drop.
The 20 nm Asymmetric P-Nylon Filter was specifically developed to allow tighter filtration in 193 nm photoresist and BARC chemistries. Its asymmetric membrane geometry provides low operation pressure while still offering an extremely tight pore structure. The nylon material provides superior micro-bridge defect reducing capabilities and the hydrophilic nature allows for rapid system start-up.
The 0.04 µm Asymmetric P-Nylon Filter is Pall’s latest addition to its P-Nylon product line. The asymmetric P-Nylon filter maintains the proven defect-reducing capabilities of Nylon 6,6 with a reduced pressure drop. This allows customers to achieve an even finer level of filtration in higher viscosity applications including i-line and 248 nm photoresist.
Point-of-Use Purification for Ultrapure Water
Pall is expanding its family of IonKleen™ Purifiers to embrace two new products for trace metal ion removal from ultrapure water (UPW) for critical cleaning processes. The ultra-high molecular weight polyethylene membrane in both products has been modified to incorporate cation exchange groups on its surface, resulting in spontaneous and immediate trace metal ion removal.
The IonKleen AQHT Purifier is specifically designed to operate in hot rinse water up to 85 ºC. The IonKleen AQF Purifier combines high particle as well as cation removal efficiency for long service life in ambient temperature UPW, typically 12-18 months. Both purifiers are available in standard cartridge configurations.