Search

Search Results
Results 1 - 10 of 1495 for Etching
  • Hiden Analytical
    Supplier Profile
    2022 marks Hiden Analytical’s 40th year of continuous and independent operation in the field of mass spectrometry.  Driven by customer and application focussed innovation, a unique and...
  • Comparison of the Bosch and a Cryogenically Cooled Deep Silicon Etch Processes
    Article - 2 Nov 2011
    The two techniques utilized to achieve deep etches in the fabrication of micro-electro-mechanical systems (MEMS) are the Cryogenic and Bosch Process.
  • WITec GmbH
    Supplier Profile
    WITec GmbH pioneered 3D Raman imaging and correlative microscopy and continues to lead the industry with a product portfolio that offers speed, sensitivity and resolution without compromise. Raman,...
  • Mattson Technology Announces Shipment of paradigmE Etch System to Key Chipmaker
    News - 16 Aug 2012
    Mattson Technology, a provider of cutting-edge semiconductor processing equipment, has reported the shipment of its paradigmE etch system to a key chipmaker. This is the first etch system supplied...
  • XEI Scientific
    Supplier Profile
    XEI Scientific, Inc. was founded in 1991 by Ronald Vane to provide an effective way to gently clean scanning electron microscopes (SEMs), focused ion beams (FIBs) and other vacuum systems. XEI...
  • Samsung Electronics
    Supplier Profile
    Samsung Electronics Co., Ltd. is a global leader in semiconductor, telecommunication, digital media and digital convergence technologies with 2005 parent company sales of US$56.7 billion and net...
  • Application of Confocal Raman Imaging to Analyse Solar Cell Material
    Article - 3 Feb 2014
    Generation of energy with the use of photovoltaic devices is being considered as an essential component in overcoming future energy shortages. This is reflected in a drastic increase in photovoltaic...
  • Imec Establishes Metrology Method for Optimizing Etch Rate Uniformity in Transformer Coupled Plasma Reactor
    News - 19 Aug 2010
    Imec and KLA Tencor have established a metrology method for optimizing the etch rate uniformity (ERU) in a transformer coupled plasma (TCP) reactor. The proposed metrology method makes use of PVx2...
  • A Microfluidic Etching Approach to High-Quality Transfer-Free Graphene
    News - 16 Jun 2022
    The etching process removes the overlying sacrificial metal and exposes the transfer-free graphene required for industrial applications. In an article recently published in Chemistry of...
  • SPTS Launches Dry Etch Tool for Via Reveal Applications
    News - 6 Sep 2012
    SPTS, the company that designs, manufactures and supplies etching solutions for the semiconductor industry, has launched the Pegasus Rapier module, which is a dry etch process tool for via reveal...

Terms

While we only use edited and approved content for Azthena answers, it may on occasions provide incorrect responses. Please confirm any data provided with the related suppliers or authors. We do not provide medical advice, if you search for medical information you must always consult a medical professional before acting on any information provided.

Your questions, but not your email details will be shared with OpenAI and retained for 30 days in accordance with their privacy principles.

Please do not ask questions that use sensitive or confidential information.

Read the full Terms & Conditions.

Provide Feedback